Semiconductor integrated circuit device

Abstract

In a semiconductor integrated circuit device having cells comprising circuit elements including MISFETs, and a multi-layer wiring structure, wirings of a first layer connected to semiconductor regions of the MISFETs (source and drain regions) are formed almost in the entire area over the regions to shunt the regions. Power supply wiring are formed of second layer wirings. First layer wirings and the semiconductor regions are connected through a plurality of contact holes. The power supply wirings are formed to cover at least part of the semiconductor regions. In accordance with another aspect, macro-cells are formed by basic cells, including a plurality of MISFETs with the direction of gate length aligned in a first direction, regularly arranged in the first direction and in a second intersecting direction. The MISFETs in each basic cell are interconnected by a first-layer signal wiring, basic cells adjacently arranged in the second direction are interconnected by a first-layer signal wiring extending in the second direction, and basic cells adjacently arranged in the first direction are interconnected by a second-layer signal wiring extending in the first direction. The MISFETs in basic cells adjacently arranged in the first direction receive power from a second-layer power wiring located in the same layer of the second-layer signal wiring and extended in the same first direction. A fourth-layer power supply wiring and a fourth-layer signal wiring, both extending in the first direction, are also provided.