The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 1996
Filed:
Jun. 03, 1994
Robert W Yanka, Liverpool, NY (US);
Milton L Noble, Liverpool, NY (US);
Martin Marietta Corporation, Syracuse, NY (US);
Abstract
A compact dual band IR focal plane assembly provides simultaneous, coincident two-dimensional image readout. It includes a MIS-CID MWIR detector array formed in an epitaxial layer grown by the MBE process on the (111B) front face of an IR transparent crystalline first substrate, the pixels thereof forming LWIR transparent windows, with opaque connections thereto lying in aisles framing the windows, and a PV diode LWIR detector array formed in an epitaxial layer grown by the LPE process on the (111A) back face of the substrate, the LWIR pixels being aligned with the transparent MWIR pixels. An MWIR MUX is provided on an IR transparent silicon second substrate arranged in front of the first substrate. The opaque switch portion of the MWIR MUX is arrayed with apertures and aisles in alignment with the windows and aisles of the MIS-CID array. An LWIR MUX is provided on a third substrate bonded to the LWIR detector array beyond the image paths, the MWIR and LWIR MUXes providing simultaneous, coincident image readout.