The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 1996
Filed:
Feb. 14, 1995
Applicant:
Inventors:
Hiroshi Ban, Machida, JP;
Akinobu Tanaka, Atsugi, JP;
Fujio Yagihasi, Kawasaki, JP;
Jun Watanabe, Kawasaki, JP;
Minoru Takamizawa, Kawasaki, JP;
Assignees:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Nippon Telegraph and Telephone Corp., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03F / ;
U.S. Cl.
CPC ...
43027014 ; 430326 ; 430905 ; 430917 ; 430918 ; 430942 ; 430966 ;
Abstract
A positive resist composition comprising a poly(p-hydroxystyrene) as matrix resin which is synthesized by an anionic polymerization method and has a weight average molecular weight of from 8,000 to 20,000, bis(p-t-butoxycarbonylmethyl)thymolphthalein as dissolution inhibitor, bis(p-t-butylphenyl)iodonium triflate as acid generator; a compound which contains one amino group and one carboxyl group to function as acid deactivator and propylene glycol monomethyl ether acetate as organic solvent.