The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 1996
Filed:
Feb. 23, 1994
Otto Albrecht, Atsugi, JP;
Hiroshi Matsuda, Isehara, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A method of forming a monomolecular film capable of independently controlling the process of forming a monomolecular film and the process of removing a part of the monomolecular film which has not been used in monomolecular film formation. The method includes, in addition to spreading a material for forming a monomolecular film onto a water surface, compressing the material on the water surface thereby transforming the material into a monomolecular film, and transferring the monomolecular film on the water surface onto a substrate, storing in a first region a part of the monomolecular film which has not been transferred to the substrate. The first region is located at a distance from a second region for preparing the monomolecular film with respect to a third region for transferring part of the film to the substrate, and has a water level lower than that of the third region.