The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 1996

Filed:

Jan. 27, 1994
Applicant:
Inventors:

Jorg W Rischke, Veldhoven, NL;

Wilhelmus G van Sprang, Eindhoven, NL;

Assignee:

MECO Equipment Engineers B.V., 's-Hertogenbosch, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D / ;
U.S. Cl.
CPC ...
204204 ; 204203 ; 2042 / ; 204622 ; 204624 ; 205128 ;
Abstract

The invention relates to an apparatus for selectively electroplating apertured products. The products are masked in accordance with the intended plating and subsequently exposed to an electrolyte in order to electroplate the products. For masking purposes a fully closed photoresist layer is electrophoretically applied to the products, and after drying of the photoresist layer, the products are covered with a photomask in accordance with the locations to be plated, after which exposure takes place. Then the photoresist layer is partially removed, while the remaining part of the photoresist layer remains behind on the products, to serve as a mask for the metal products upon electroplating.


Find Patent Forward Citations

Rischke, Jorg. (1996). Apparatus for selectively electroplating apertured metal or metallized (U.S. Patent No. 5512154). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5512154

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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