The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 1996
Filed:
Mar. 31, 1994
Leighton Lee, II, Guilford, CT (US);
The Lee Company, Westbrook, CT (US);
Abstract
A method for providing resistance to flow through a flow passageway comprises partially blocking flow through an orifice of reduced diameter by masking the orifice with an element formed of porous material retained immediately adjacent to every side of the orifice that is expected to be exposed to higher pressure fluid with a greater surface area of the porous masking element being exposed to fluid in the passageway on the higher pressure side of the orifice than is exposed by the orifice to the lower pressure fluid. The orifice may be formed by direct configuration of the passageway walls or by a body adapted to retain the masking element in the body, the outside of the body being adapted to for secure installation within the flow passageway. Resistors in accordance with the present method may have masking elements on one side for use with one directional pressure differentials or masking elements on both sides for use in applications in which bidirectional pressure differentials are anticipated.