The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 1996
Filed:
Nov. 28, 1994
Tatsumi Hiramoto, Tokyo, JP;
Tatsushi Igarashi, Himeji, JP;
Hiromitsu Matsuno, Himeji, JP;
Takeo Matsushima, Takasago, JP;
Shinichi Iso, Takasago, JP;
Ushiodenki Kabushiki Kaisha, Tokyo, JP;
Abstract
An oxidation process for an article to be treated in which, by generating ozone with a high concentration, a high treatment rate is achieved. In particular, an oxygen-containing fluid is irradiated with a vacuum ultraviolet rays emitted from a dielectric barrier discharge lamp in which xenon gas is encapsulated, producing a photochemical reaction from which ozone and an activated oxygen result. By causing this ozone and activated oxygen to contact the surface of the article to be treated, the surface of the article is oxidized. An even higher treatment rate can be achieved by generating the activated oxygen with the simultaneous use of a far ultraviolet ray source, thereby increasing the activity of the activated oxygen. Advantageously, the oxidation of the article to be treated with the vacuum ultraviolet rays and far ultraviolet rays is performed in accordance with the relationship: