The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 1996
Filed:
May. 27, 1992
Siegfried Schulz, Hanau, DE;
Christoph Daube, Tsukuba, JP;
Alfred Belz, Erlensee, DE;
Andreas Rack, Hanau, DE;
Leybold Aktiengesellschaft, Hanau, DE;
Abstract
For the production of a coating formed by cathode sputtering, a target made from an alloy of gold and preferably vanadium is used. During the cathode sputtering, nitrogen gas is used as the reactive gas. The result is the formation of vanadium nitrides on the substrate to be coated. By varying the nitrogen content, the proportion of the vanadium nitrides can be changed thereby causing the appearance and the hardness of the coating to also change. This change in coating characteristics can accommodate a broad range of requirements avoiding the necessity of using different targets for different coating characteristics.