The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 1996
Filed:
Jun. 30, 1994
Applicant:
Inventors:
Douglas J Resnick, Phoenix, AZ (US);
William A Johnson, Paradise Valley, AZ (US);
Hector T Chen, Madison, WI (US);
Assignee:
Motorola, Inc., Schaumburg, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
378 34 ; 378 35 ;
Abstract
An x-ray lithography method for irradiating an object (14) to form a pattern thereon uses an x-ray mask (10) having a membrane (18). The membrane (18) has an open membrane surface (26), and x-ray radiation (16) is passed through the open membrane surface (26) to irradiate the object (14). During this irradiation, the open membrane surface (26) is substantially uniformly exposed to the x-ray radiation (16) so that stress-induced distortion of the membrane (18) is reduced.