The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 1996
Filed:
Sep. 01, 1994
Applicant:
Inventors:
Ryo Kuroda, Machida, JP;
Toshihiko Miyazaki, Hiratsuka, JP;
Kunihiro Sakai, Isehara, JP;
Hiroyasu Nose, Zama, JP;
Kiyoshi Takimoto, Isehara, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J / ;
U.S. Cl.
CPC ...
2504911 ;
Abstract
A method and apparatus for detecting the relative positional displacement between a mask and a wafer. The mask is provided with a cantilever. The position mark is provided on the wafer so as to face the cantilever. A relative positional displacement between the mask and the wafer is detected from a deformation amount of the cantilever based on a force acting between the position mark and the cantilever upon relative movement of the position mark and the cantilever.