The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 1996
Filed:
Aug. 19, 1994
Anthony J DeNicola, Jr, New Castle County, DE (US);
John W Mayfield, New Castle County, DE (US);
Thomas F McLaughlin, New Castle County, DE (US);
James R Beren, Chester County, PA (US);
Montell North America Inc., Wilmington, DE (US);
Abstract
Disclosed is a normally solid, high molecular weight, gel-free, irradiated ethylene polymer having a density of from 0.89 to 0.97 g/cc characterized by high melt strength due to strain hardening which is believed to be caused by free-end long chain branches of the molecular chains forming the polymer. Also disclosed is a process for making the polymer by high energy radiation of a normally solid, high molecular weight, ethylene polymer in a reduced active oxygen environment, maintaining the irradiated material in such environment for a specific period of time, and then deactivating free radicals in the material.