The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 1996
Filed:
Mar. 21, 1995
Takeshi Ito, Colorado Springs, CO (US);
Carlos A Paz de Araujo, Colorado Springs, CO (US);
Hitoshi Watanabe, Tokyo, JP;
Michael C Scott, Colorado Springs, CO (US);
Symetrix Corporation, Colorado Springs, CO (US);
Olympus Optical Co., Ltd., Tokyo, JP;
Abstract
A liquid precursor containing a metal is applied to a first electrode, RTP baked at a temperature of 700.degree. C., and annealed at the same temperature for from 3 to 5 hours to form a layered superlattice material. A second electrode is formed to form a capacitor, and a second anneal is performed at a temperature of 700.degree. C. If the material is strontium bismuth tantalate, the precursor contains u mole-equivalents of strontium, v mole-equivalents of bismuth, and w mole-equivalents of tantalum, where 0.8.ltoreq.u.ltoreq.1.0, 2.0 v.ltoreq.2.3, and 1.9.ltoreq.w.ltoreq.2.1.