The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 1996
Filed:
Jul. 08, 1994
Applicant:
Inventor:
Masaya Komatsu, Tokyo, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430320 ;
Abstract
A phase-shifted photo mask capable of discrimination between phase shifting portions and a transparent portion (a bare surface portion of a substrate) by microscope observation with visible light. An SOG (spin-on-glass) layer mixed with inorganic colored ions (Co.sup.2+, Mn.sup.3+, Ni.sup.2+ or the like) having an absorption characteristic to the visible light is formed on the surface of the substrate which is substantially transparent to an exposure light (ultraviolet light) and the undesired portions of the SOG layer excluding the portions which are to form the phase shifting portions are removed.