The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 1996
Filed:
Jul. 19, 1994
Applicant:
Inventors:
Armin Klumpp, Munchen, DE;
Erwin Hacker, Kaufbeuren, DE;
Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C08J / ;
U.S. Cl.
CPC ...
427515 ; 427509 ; 427510 ; 4272551 ; 4272556 ; 427314 ;
Abstract
Lacquer films sensitive to ultraviolet (UV) and/or electron beam radiation re applied to substrates as masking layers by a process known as the 'spin on process'. This invention is a new method of applying a lacquer film sensitive to UV and/or electron beam radiation. A vinyl-containing substance and a linear or cyclic siloxane are vaporized and then deposited onto the substrate to be masked. In the preferred embodiment of the invention, the substances utilized are octamethylcyclotetrasiloxane and trivinylmethylsilane.