The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 1996
Filed:
Sep. 12, 1994
Applicant:
Inventors:
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
25055926 ; 250548 ; 2502012 ; 355 53 ; 356401 ;
Abstract
An exposure apparatus includes a projection optical system for projecting a pattern on a mask onto a photosensitive substrate and a measuring unit for measuring distances between the mask and the projection optical system at a plurality of positions within a surface of the mask. The position of the photosensitive substrate with respect to the projection optical system is changed on the basis of a plurality of the distances measured by the measuring unit.