The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 1996
Filed:
Jul. 25, 1994
Jacob Y Wong, Santa Barbara, CA (US);
Gaztech International Corporation, Goleta, CA (US);
Abstract
Apparatus for measuring the concentration of a gas present in a sample chamber by ambient pressure diffusion employs a nondispersive infrared gas analysis technique. The sample chamber has the form of a tube that is closed at one end, with a source of radiation and a detector mounted side by side at the other end. The inwardly-facing surfaces of the tube are specularly reflective, whereby the optical length of the sample chamber is twice its physical length. A gas filter cell located in the optical path permits the concentration of an analyte gas to be measured accurately despite the presence in the sample chamber of an interfering gas. A small ultrasonic vibrator affixed to the wall of the sample chamber prevents unwanted particles from accumulating on the semipermeable membranes through which ambient gases diffuse into and out of the sample chamber.