The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 1996
Filed:
Jun. 21, 1994
Omron Corporation, Kyoto, JP;
Abstract
Disclosed is a system for automatic adjustment of character spacing suited to characters in innumerable combinations, such as in the case with Chinese characters and hiragana and katakana characters in the Japanese language. In character dot data of a plurality of characters which construct a character string developed in memory, character density data representing the broadness of the character face of a character, character face overlap area data representing degree of overlap between this character and a character adjacent thereto in a state in which the character and adjoining character are closest to each other, and blank-space area data representing the broadness of blank space produced between the two characters are generated for each and every character. The appropriate character spacing is inferred for each character through fuzzy reasoning by applying the character density data, character face overlap area data and blank-space area data to already given knowledge relating to character spacing adjustment.