The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 1996
Filed:
Mar. 27, 1995
Applicant:
Inventor:
Danny D Yang, San Diego, CA (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
4271263 ; 427240 ; 427241 ; 4273762 ; 427377 ; 427384 ;
Abstract
A process for forming dielectric thin film coating suitable for use in magnetic thin film heads includes the application of a spin-on-glass material on a substrate, the spinning of the substrate, the preheating of the substrate and thin film to remove the solvents in the spin-on-glass material, and the heating in a reducing or in an inert atmosphere of the film to provide a conversion to a SiO.sub.2 film. The reducing and the inert atmospheres permit carbon to be left in the film. The presence of the carbon improves structural properties of the thin films.