The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 1996
Filed:
Dec. 06, 1994
Norihiko Samoto, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
A method for thermally treating a resist film for forming an undercut pattern therein includes forming internally in the resist film a distribution of temperatures falling from the surface of the resist film toward an interface between the resist film and the substrate. The heat source and the resist film are brought to a state wherein they are located closely to each other while maintaining an untouching space. This state is kept for a predetermined time period, and the resist film and the heat source are caused to be spaced away from each other to a location wherein the resist film is free from being influenced by the heat source. Only by having a desired pattern exposed and subsequently developed, it is possible to form the resist pattern in an undercut form in the resist film which is useful as an underlying pattern in a lift-off process. Far-ultraviolet rays may be applied on an entire surface of the resist film after the developing process so as to enhance thermal resistance characteristics of the resist patter in the resist film.