The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 1996
Filed:
Mar. 31, 1994
Kazuo Imasaki, Osaka, JP;
Institute for Laser Technology, Osaka, JP;
Abstract
A method and apparatus for producing high-intensity X-rays or .gamma.-rays by accumulating a laser beam in an optical resonator having ultra-high reflectivity mirrors. With this arrangement, it is possible to produce powerful X-rays or .gamma.-rays even if the laser beam used is not powerful enough. A laser beam from a laser is injected into an optical resonator and accumulated therein. The optical resonator has an opposed pair of mirrors having a reflectivity of more than 0.999%. An electron beam may be introduced obliquely into the optical resonator and collided against the laser beam. In the interaction area thus created, X-rays or .gamma.-rays are produced due to the Compton scattering and propagated out of the optical resonator.