The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 1996
Filed:
Oct. 20, 1994
Applicant:
Inventors:
Assignee:
Kureha Chemical Industry Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C / ; C07C / ;
U.S. Cl.
CPC ...
568483 ; 569457 ;
Abstract
A method for producing high purity chloroaldehyde monomers at a high yield by depolymerization of a chloroaldehyde cyclic trimer represented by the following formula, ##STR1## wherein R is a hydrogen atom, methyl group, or an ethyl group. The depolymerization reaction can be carried out in the presence of activated clay. Said chloroaldehyde cyclic trimer can be stored in a stable manner and chloroaldehyde monomers obtained by the depolymerization can be used as are as a raw material for the synthetic reaction of chloroaldehyde derivatives.