The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 1996

Filed:

Jan. 10, 1994
Applicant:
Inventors:

Naoya Yabuuchi, Suita, JP;

Shinichi Ishikura, Tsuzuki, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03G / ;
U.S. Cl.
CPC ...
430110 ; 430111 ; 430137 ; 430138 ; 428356 ; 428402 ; 42840221 ; 42840222 ; 524589 ; 524700 ; 524716 ; 528 62 ; 42721334 ;
Abstract

The present invention provides a polyurea-covered particle having a narrow particle size distribution, which comprises a vinyl polymer particle as a seed particle and a polyurea cover layer formed on the vinyl polymer particle. The present invention also provides a process for producing the polyurea-covered particle having a narrow particle size distribution, which comprises:


Find Patent Forward Citations

Yabuuchi, Naoya. (1996). Polyurea-covered particle having narrow particle size distribution and (U.S. Patent No. 5494769). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5494769

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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