The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 1996
Filed:
Nov. 29, 1994
Applicant:
Inventors:
Rointan F Bunshah, Playa del Rey, CA (US);
Shyankay Jou, Santa Monica, CA (US);
Shiva Prakash, Santa Barbara, CA (US);
Hans J Doerr, Westlake Village, CA (US);
Assignee:
The Regents of the University of California, Oakland, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20419215 ; 20419212 ; 20429819 ;
Abstract
A process and system for producing fullerenes by sputtering. A carbon target is sputtered to form a vapor of sputtered carbon atoms. The sputtered carbon atoms are quenched in an atmosphere of inert gas and deposited onto a collection substrate. The resulting carbon soot is extracted to recover fullerenes. The process produces carbon soot which is rich in C.sub.70 and higher fullerenes.