The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 1996
Filed:
Dec. 16, 1992
George A Rakuljic, Santa Monica, CA (US);
Victor Leyva, Los Angeles, CA (US);
Accuwave Corporation, Santa Monica, CA (US);
Abstract
A method of writing plane holographic gratings Bragg-matched for reflection in the infrared in a photorefractive material using shorter wavelength light through a face perpendicular to the grating planes. The writing beam wavelength is selected to be within the photorefractive sensitivity range of the crystal and the angles are chosen relative to the wavelength to define a reflection grating with a period such that counter-propagating reflection occurs at the desired IR wavelength. For reflection gratings at different wavelengths, either the transmission or the reflection mode geometry may be used. In the transmission mode, the writing beams are incident on the same side face while in the reflection made the writing is on opposite faces in an off-axis (non-counter-propagating) configuration. Anti-reflection coatings of the appropriate wavelengths are used on the crystal surfaces to reduce reflection losses and improve the diffraction efficiency of the grating.