The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 1996
Filed:
Mar. 06, 1995
Applicant:
Inventors:
Carl W Nelson, Hayward, CA (US);
Richard D Weir, Agoura Hills, CA (US);
Assignee:
Tulip Memory Systems, Inc., Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20419215 ; 20419222 ; 20429806 ; 20429808 ; 20429825 ; 20429826 ;
Abstract
A sputtering apparatus for depositing thin films on substrates is disclosed, which includes a process chamber having a central sputtering region and an annular plasma distribution region surrounding and open to the central sputtering region, a planar disk diode positioned in the central sputtering region of the process chamber, a mechanism for positioning a substrate within the central sputtering region adjacent to the planar disk diode, and a plasma generation means for supplying plasma to the annular plasma distribution region of the process chamber for diffusion into the central sputtering region.