The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 1996
Filed:
Sep. 20, 1994
Shinya Akamine, Palo Alto, CA (US);
Hirofumi Yamada, Tsukuba, JP;
The Board of Trustees of the Leland Stanford University, Stanford, CA (US);
Abstract
A combined atomic force and near field microscope assembly for atomic level inspection of a target object. The assembly includes a scanning probe with a sharp tip and a photosensitive region on its lower surface. A sample is disposed on a glass substrate and exposed to an evanescent wave generated on the glass substrate by total internal reflection. An optical probe comprising a microfabricated cantilever having an apex in close proximity to a photosensitive region is disposed in close proximity to a sample. The photosensitive region collects light generated by FTR at the apex of the optical probe due to local disruptions of the evanescent field caused by the probe tip. A cantilever displacement mechanism is included so as to allow for operation in a second mode as a conventional atomic force microscope.