The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 1996
Filed:
Jan. 17, 1995
Kenji Otsuka, Hiratsuka, JP;
Noboru Takemasa, Hiratsuka, JP;
Japan Pionics Co., Ltd., Tokyo, JP;
Abstract
There is diclosed a process for purifying hydrogen gas which comprises removing impurities such as nitrogen, oxygen, methane, carbon monoxide, carbon dioxide and moisture contained in a crude hydrogen gas by bringing the crude hydrogen gas into contact under heating with a hydride of a zirconium alloy such as Zr-V, Zr-V-Ni, Zr-V-Cr, Zr-V-Co, Zr-V-Fe, Zr-V-Cu, Zr-V-Ni-Cr, Zr-V-Ni-Co and Zr-V-Cr-Fe. By virtue of using the above Zr alloy hydride, the process enables highly advanced purification of crude hydrogen gas by removing such impurities as above to a level as low as 1 ppb or less in high safety and efficiency at low installation and running costs.