The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 1996
Filed:
May. 31, 1994
Eric I Madaras, Yorktown, VA (US);
Abstract
A method for the x-ray inspection of materials making use of the Moire effect is described. The Moire effect results when two patterns are superimposed, a third pattern is produced. Any change in either of the first two patterns creates a change in the third. Moire inspection is common with visible light, this invention allows the technique to be extended to locations inaccessible to visual inspection. A first pattern of high radio contrast material is attached to or included in the sample. X-rays are projected through the sample. A second pattern is imposed at the observation point, either before or after the formation of the x-ray image. The two patterns interact to create a third, Moire, pattern. As the material is stressed the Moire pattern changes, the degree of change indicating the degree of stress.