The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 1996
Filed:
Jun. 06, 1994
William C Stapel, Dearborn, MI (US);
Bernardus J Stapel, Dearborn Heights, MI (US);
Ford Motor Company, Dearborn, MI (US);
Abstract
A multi-faceted light reflector has a reflecting surface with a plurality of adjacent facets, a light source placed in a predetermined spatial relationship to the reflecting surface, and an image surface placed in a predetermined spatial relationship to the light source and the reflecting surface. Each facet has a plurality of edges bounding each facet with each edge joining an edge of an adjacent facet to define a common edge between the two adjacent facets. The surface of the facet generally has three curvature regions. The first region is a base curvature surface portion formed in a predetermined relation to the light source and the image surface for illuminating a predetermined first area of the image surface. The second region is an edge curvature surface portion of each facet adjacent the edges for illuminating a second area of the image surface displaced in predetermined angular relation to the base portion. The third region is an intermediate curvature surface portion which continuously and smoothly connects the base curvature surface portion and the edge curvature surface portion. The intermediate curvature portion illuminates a third area between the first area and the second area.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile