The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 1996
Filed:
Sep. 01, 1993
Applicant:
Inventor:
George Gal, Palo Alto, CA (US);
Assignee:
Lockheed Missiles & Space Company, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430321 ;
Abstract
A microlens of any designed configuration is formed as a replica in a photoresist material, and the photoresist material replica is used to reproduce the replica directly in a substrate material.
Gal, George. (1996). Exposure mask for fabricating microlenses (U.S. Patent No. 5482800). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5482800
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile