The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 09, 1996

Filed:

Dec. 30, 1993
Applicant:
Inventors:

Katsuo Hiratsuka, Haga, JP;

Masanori Ayuta, Tochigi, JP;

Koichi Nakayama, Tochigi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A41F / ; D05B / ;
U.S. Cl.
CPC ...
112437 ;
Abstract

In a bar tacking stitch pattern comprising lateral stitches formed in a sewn product in such a way as to cover the starting and ending portions of overedge chain stitches which are formed on the periphery of a button hole in the direction substantially at right angles to the extending direction thereof and zigzag stitches which cross the lateral stitches, a pair of stitches of the zigzag stitches are formed on both sides of an end portion of the button hole adjacent thereto in such a way as to be substantially symmetrical with regard to the button hole and a pair of stitches of the lateral stitches are formed on both sides of the end portion of the buttonhole adjacent thereto outside the area between a pair of line segments which respectively extends through the pair of stitches of the zigzag stitches in the extending direction of the button hole. As a result, stitches of lateral stitches are not formed in the portion of the sewn product adjacent to the buttonhole which is in a weak condition so that it is possible to form a stable and uniform bar tacking stitch pattern so as to improve the quality of the sewn product.


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