The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 1996
Filed:
Sep. 21, 1993
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An information processor for performing at least one of recording information at a high density, reproducing and erasing information by applying the principle of a scanning tunnel microscope (STM) or an atomic force microscope (AFM) and an information processing method using the information processor. The information .processor is used with a recording medium comprising a recording layer having a characteristic of one of an insulator and a semiconductor. The processor includes a substrate electrode in the recording medium, at least one probe electrode disposed close to the recording medium, and at least one of a circuit for applying an information recording pulse voltage and a circuit for applying an information reproducing pulse voltage. A maximum difference in surface level of a 1.times.1 .mu.m surface region of the substrate electrode is 1 nm or less, and the radius of curvature of a tip of the probe electrode is in the range of 0.1 to 200 .mu.m. The processor further includes a device for controlling the distance between a surface of the recording medium and the tip of the probe electrode.