The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 1996
Filed:
Jun. 24, 1994
Charles J Kramer, Webster, NY (US);
Geoffrey B Gretton, Honeoye Falls, NY (US);
Holotek Ltd., Rochester, NY (US);
Abstract
Centered monofacet deflector systems having a dipole laser beam scanning pattern (dual scanning beams which propagate in opposite directions) enables both the scan rate and the scan duty cycle of the scanning system to be doubled over deflectors which produce only one beam. The deflector may be a non-disc plane diffraction grating (NPDG) deflector or a dual reflecting cube (DRC) deflector having polarization sensitive beam splitting characteristics. The input beam polarization contains or is generated to contain orthogonally polarized components which are reflected or diffracted to produce one of the dual scanning beams and a transmitted beam through the element and retroreflected with the proper polarization to be deflected at the element to produce the other scanning beam thereby providing the capability of two simultaneous or sequential scan lines for every revolution of the deflector element. The deflector systems are useful for imaging applications, especially on recording media mounted on the internal surface of a drum.