The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 1996
Filed:
Nov. 22, 1991
Tadao Toyama, Shizuoka, JP;
Kenji Kunichika, Shizuoka, JP;
Fuji Photo Film Co., Ltd., Minami-ashigara, JP;
Abstract
A method for preparing a lithographic printing plate comprises imagewise exporting a PS plate comprising an aluminum substrate having an anodized layer and a light-sensitive layer applied on one side of the substrate and then developing the PS plate with a developer comprising an aqueous solution of an alkali metal silicate, while compensating changes in the developer due to the development of the PS plate by supplementing, to the developer, a replenisher comprising an aqueous solution of an alkali metal silicate, wherein the PS plate is provided with a coating layer containing an organic polymeric compound on the back face and the replenisher is an aqueous solution of an alkali metal silicate having a ratio: [SiO.sub.2 ]/[M.sub.2 O] (wherein [SiO.sub.2 ] means molar concentration (mol/l) of SiO.sub.2 and [M.sub.2 O] is molar concentration (mol/l) of oxide M.sub.2 O of an alkali metal (M)) ranging from 0.3 to 1.0 and an SiO.sub.2 content ranging from 0.5 to 4.0% by weight. The method makes it possible to substantially reduce the amount of the developer to be replenished, does not cause any formation of insolubles even if a great deal of PS plates are processed over a long time period and thus stable developing treatment can be carried out.