The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 1996
Filed:
May. 02, 1994
Applicant:
Inventor:
Manfred Hain, Zorneding, DE;
Assignee:
Siemens Aktiengesellschaft, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F / ;
U.S. Cl.
CPC ...
216 67 ; 216 77 ; 252 791 ;
Abstract
Aluminiferous structures having a sidewall angle greater than or equal to zero are produced by the addition of a volatile hydrocarbon to the etching gas mixture in a plasma etching process. The volatile hydrocarbon promotes the sidewall passivation, so that extremely fine structures can be anisotropically etched. Given aluminum-copper alloys, moreover, the formation of etching residues that contain copper and are not easily volatilized is also prevented.
Hain, Manfred. (1996). Method for the anisotropic etching of an aluminiferous layer (U.S. Patent No. 5480051). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5480051
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile