The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 1995
Filed:
Mar. 29, 1995
Applicant:
Inventors:
Philip G Kosky, Schenectady, NY (US);
Thomas R Anthony, Schenectady, NY (US);
Assignee:
General Electric Company, Worthington, OH (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C / ; C23C / ;
U.S. Cl.
CPC ...
264 81 ; 427249 ; 427255 ; 4272551 ; 427122 ; 423446 ; 428408 ; 117920 ;
Abstract
A method for producing CVD diamond film on a substrate comprised of a hydride-forming metal. The substrate provides for easy release of the CVD diamond coating formed thereon upon exposure to a hydrogen pressure. Self-supporting CVD diamond films of large dimension are easily obtained without dissolving the substrate. The substrate can be used in conventional CVD reactors.
Quick Actions:
Kosky, Philip. (1995). Cvd diamond growth on hydride-forming metal substrates (U.S. Patent No. 5478513). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5478513
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile