The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 26, 1995

Filed:

Jul. 08, 1994
Applicant:
Inventor:

Rudolf Latz, Rodgau-Dudenhofen, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ;
U.S. Cl.
CPC ...
20429819 ; 20429816 ; 20429838 ;
Abstract

A microwave ring resonator surrounds a cathode target and feeds microwaves to a plasma volume over the target through a slit system in such a way that the waves do not pass through the cathode dark space.


Find Patent Forward Citations

Latz, Rudolf. (1995). Plasma sputtering installation with microwave enhancement (U.S. Patent No. 5478459). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5478459

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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