The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 1995
Filed:
Aug. 01, 1994
Applicant:
Inventors:
Majid M Hashemi, Tempe, AZ (US);
Jonathan K Abrokwah, Tempe, AZ (US);
Stephen P Rogers, Phoenix, AZ (US);
Assignee:
Motorola, Inc., Schaumburg, IL (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
1566461 ; 437228 ; 20419235 ;
Abstract
A layer is plasma etched or deposited with a gaseous mixture of a hydrocarbon, hydrogen and a noble gas. A cathode DC bias of greater than 600 V is used. This cathode DC bias allows for selectively etching a III-V material over an aluminum containing layer or for the deposition of a hydrogenated carbon film.
Hashemi, Majid. (1995). Selective processing using a hydrocarbon and hydrogen (U.S. Patent No. 5478437). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5478437
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile