The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 26, 1995

Filed:

Dec. 27, 1994
Applicant:
Inventors:

Paul M Winebarger, Austin, TX (US);

Mark A Zaleski, Austin, TX (US);

Troy B Morrison, Austin, TX (US);

Jeffrey J Sultemeier, Buda, TX (US);

Assignee:

Motorola, Inc., Schaumburg, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
1566361 ; 134-3 ; 1566451 ; 1566561 ; 216 38 ; 216 52 ; 216 88 ; 252 793 ; 252 794 ;
Abstract

A selective cleaning process for fabricating a semiconductor device includes the steps of processing a semiconductor substrate (10) and introducing metal contaminants (22) by contacting the semiconductor substrate (10) with a polishing slurry during a polished planarization process. The metal contaminants (22) are removed by applying a cleaning solution including an organic solvent and a compound containing fluorine. The chemical constituents of the cleaning solution are substantially unreactive with metal interconnect material (12) underlying dielectric layers (18) present on the semiconductor substrate (10). The preferred cleaning solution comprises an aqueous solution of ethylene glycol and ammonium fluoride.


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