The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 1995
Filed:
Dec. 15, 1993
Idemitsu Kosan Co., Ltd., Tokyo, JP;
Abstract
A process for the production readily slidable films which are stretched films. The process comprises (a) uniaxially stretching in a machine direction a pre-molded product comprising a composition of a styrene polymer having a high degree of syndiotactic configuration compounded with 0.001 to 1% by weight of inorganic filler particles with an average particle diameter of 0.01 to 3 .mu.m, or simultaneously, biaxially stretching the premolded product in the machine direction and the transverse direction and (b) subsequently uniaxially restretching the premolded product in the traverse direction or simultaneously, biaxially restretching the premolded product in the machine direction and the transverse to produce a film having a surface roughness Ra of 0.005 to 0.03 .mu.m, and a static friction coefficient .mu.s of 0.3 to 1.0. The readily slidable films have high heat resistance, mechanical strength and electrical insulating properties and are excellent in sliding properties and smoothness.