The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 19, 1995

Filed:

Feb. 06, 1995
Applicant:
Inventors:

Nobuhiro Fueki, Wako, JP;

Atsushi Inaba, Wako, JP;

Nariaki Kuriyama, Wako, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
437250 ; 156292 ; 7351403 ; 437927 ; 148D / ; 148D / ;
Abstract

A semiconductor gas rate sensor includes a base composed of a first semiconductor substrate and a second semiconductor substrate bonded thereto by a thermosetting adhesive layer deposited on a mating surface of the second semiconductor substrate, the base having a gas flow passage defined therein and a nozzle defined therein for injecting a gas flow into the gas flow passage, and a detector disposed in and extending across the gas flow passage for detecting a deflected state of the gas flow when an angular velocity acts on the base, the nozzle being formed between a recess defined in mating surface of the first semiconductor substrate and the mating surface of the second semiconductor substrate. To manufacture the semiconductor gas rate sensor, the first semiconductor substrate and the second semiconductor substrate are joined to each other with the thermosetting adhesive layer on the mating surface of the second semiconductor substrate, and thereafter, the first semiconductor substrate and the second semiconductor substrate are heated while the second semiconductor substrate is being kept underneath the first semiconductor substrate.


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