The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 1995
Filed:
Aug. 26, 1993
Toru Abiko, Miyagi, JP;
Mari Yoshida, Miyagi, JP;
Takashi Kishi, Miyagi, JP;
Hiroshi Nakayama, Miyagi, JP;
Sony Corporation, Tokyo, JP;
Abstract
A magneto-optical recording medium having at least two kinds of films consisting of a rare earth metal-transition metal alloy thin film and a dielectric film formed on a substrate. The dielectric film is formed by sputtering a target in an atmosphere containing at least an oxygen gas or a compound gas containing oxygen as one constitutional element. Particularly, the use of a carbon dioxide gas CO.sub.2 or a carbon monoxide gas CO provides for an SiCON film rather than an Si.sub.3 N.sub.4 film. The SiCON film has a refractive index and an absorptivity almost identical with those of the Si.sub.3 N.sub.4 film, and has a thermal conductivity smaller than that of the Si.sub.3 N.sub.4 film. As a result, it has been found that the SiCON film is advantageous from the viewpoints of a magnetic field sensitivity and a film thickness.