The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 19, 1995

Filed:

Aug. 04, 1994
Applicant:
Inventors:

Akio Todokoro, Naka, JP;

Yoshiyuki Kihara, Naka, JP;

Takashi Okada, Katsuta, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01G / ;
U.S. Cl.
CPC ...
423-6 ; 423-7 ; 210682 ; 976D / ; 75344 ;
Abstract

A method of separating and recovering Pu and Np from a Pu- and Np-containing nitric acid solution. The method comprises the steps of subjecting a nitric acid solution containing Pu and Np to valence adjustment by adding a reducing agent consisting of hydroxylamine nitrate and hydrazlne to said nitric acid solution so as to reduce Pu and Np in said nitric acid solution to Pu (III) and Np (IV), respectively; adjusting a nitric acid concentration of said nitric acid solution after said valence adjustment to 6 to 8 M; bringing said nitric acid solution after said nitric acid concentration adjustment into contact with a strong basic anion exchange resin so as to cause Np to be selectively adsorbed by said resin and to separate and recover Pu as a plutonium nitrate solution; and eluting said adsorbed Np (IV) by using diluted nitric acid of 1 M or below so as to recover Np as a neptunium nitrate solution. The valence adjustment step may be carried out by subjecting the Pu- and Np-containing nitric acid solution to electrolytic reduction instead of using the reducing agent.


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