The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 12, 1995

Filed:

Sep. 21, 1993
Applicant:
Inventors:

Thomas M Crook, New Brighton, MN (US);

Delmer L Smith, Edina, MN (US);

Robert G Ahonen, Cedar, MN (US);

Assignee:

Honeywell Inc., Minneapolis, MN (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
250397 ;
Abstract

An apparatus for monitoring ion beams with an electrically isolated aperture includes an ion beam source for generating an ion beam and an electrically conductive aperture plate arranged to collimate the ion beam. The aperture plate is electrically isolated from the rest of the deposition apparatus and is divided into a plurality of electrically isolated segments. A current monitoring device has an input connected to the aperture plate so as to monitor current from the aperture plate which is indicative of the ion beam performance.


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