The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 05, 1995

Filed:

Oct. 08, 1993
Applicant:
Inventors:

Ten-Hsing Jaw, Hsingchu, TW;

Chao-Fu Hong, Taipei, TW;

Ching-Yi Wu, Hsingchu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B / ;
U.S. Cl.
CPC ...
385 14 ; 385 43 ; 385129 ;
Abstract

The present invention discloses an OIC fabrication system which includes a tapered angle computing means for computing a tapered angle for aching a required coupling efficiency. The fabrication system also includes a fabrication control means which includes a tabulated fabricating parameter database for determining and controlling a plurality of fabricating parameters. The fabrication system also includes an etching system which receives a plurality of control signals from the fabrication controlling means to carry out the etching process to form a tapered etching angle such that the optical coupling efficiency can be achieved.


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