The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 1995
Filed:
Jul. 07, 1994
George Gal, Palo Alto, CA (US);
William W Anderson, Half Moon Bay, CA (US);
Bruce J Herman, Mountain View, CA (US);
Dean M Shough, Newark, CA (US);
Lockheed Missiles & Space Company, Inc., Sunnyvale, CA (US);
Abstract
Wavefront correction apparatus for correcting a stepped wavefront output produced by certain angles of scan and by certain positions of scan in scanning microlens arrays includes anamorphic transfer optics with diffractive corrections. The transfer optics form the outputs of all of the unit cell trains of the microlens arrays into a unique, separate, linear image at each position of scan of the scanning array. A stepped wavefront corrector is positioned in the path of each linear image, and selected thicknesses of the material in the stepped wavefront corrector are effective to vary the times of optical passage through the stepped wavefront corrector in amounts to restore the wavefront to a continuous, unstepped form at the outlet of the plate.