The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 1995
Filed:
Feb. 23, 1995
James R Penny, Fayetteville, AR (US);
Other;
Abstract
There is disclosed a system for linearizing an RF amplifier by the application of suitable load impedances to its 2nd, 3rd, and higher order output signals, thereby reducing output distortion products and improving performance. Intermodulation Distortion (IMD) reduction results from controlled termination of harmonic tuned filters produced by impedance selection and/or filter detuning. Preferably the apparatus comprises parallel band-pass filters including a filter passing the fundamental signals only; a filter passing 2nd harmonics; and a filter passing the 3rd harmonics. These, and optionally higher order filters, are employed for suppressing harmonic frequencies and reducing IMD. Preferably all filters have sufficient isolation to prevent serious interaction between filters. Therefore a selected mismatch provided at each of the harmonic output ports linearizes the amplifier's output. In some applications it is useful to mistune the filter to create a load impedance mismatch to cause the desired Intermodulation Distortion reduction. The system may be at the front end and/or output of an RF amplifier. Utilizing a suitable probing device the system may be used as a testing tool or for screening MIMIC RF amplifiers still in wafer form, or may be used to select a suitable load impedance for the MIMIC for later correction of IMD time or for selecting MIMICS which exhibit better IMD characteristics.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile