The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 1995
Filed:
Sep. 13, 1994
Tatsuhiko Ikeda, Hyogo, JP;
Kazuhito Niwano, Kanagawa, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
Disclosed is a semiconductor device including a bipolar transistor and a field effect transistor and allowing an increased operating speed, and a method of manufacturing such a semiconductor device. In the semiconductor device, a junction depth of an intrinsic base layer and a junction depth of an external base layer are made shallower than a junction depth of source/drain regions. Whereby a parasitic capacitance of the bipolar transistor portion is reduced, and at the same time, a driving current of the field effect transistor portion is increased to some extent. Consequently, an increased operating speed of the bipolar transistor portion and the field effect transistor portion is achieved.