The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 21, 1995

Filed:

Jun. 29, 1993
Applicant:
Inventor:

Warren C Rosvold, Sunnyvale, CA (US);

Assignee:

Raytheon Company, Lexington, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01C / ;
U.S. Cl.
CPC ...
437 60 ; 437918 ; 437142 ; 338308 ; 20419221 ;
Abstract

A method of fabricating a thin film resistor includes a step of sputter depositing a thin film of resistive material such as a chromium diboride compound on an insulative substrate using an argon sputter gas having a percentage of dopant such as nitrogen selected to optimize a trade off between desirably increasing the thickness of the film and undesirably increasing the temperature coefficient of resistance. A cap layer having a solid diffusant such as free chromium is deposited over the thin film of resistive material. The cap layer serves to protect the thin film of resistive material during subsequent patterning of conductors using wet etching, and also the solid diffusant diffuses into the resistive material during subsequent thermal treatment to drive the temperature coefficient of resistance back down.


Find Patent Forward Citations

Loading…