The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 1995
Filed:
Nov. 15, 1993
Applicant:
Inventors:
Masao Shaku, Yokohama, JP;
Sayuri Ohkura, Yokohama, JP;
Hideo Kuroda, Yokohama, JP;
Ai Kano, Yokohama, JP;
Nobuo Nakabayashi, Koganehara, Matsudo-shi, Chiba-ken, JP;
Assignees:
Pola Chemical Industries Inc., , US;
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61K / ; A61K / ; A61K / ;
U.S. Cl.
CPC ...
424 7016 ; 424 7803 ;
Abstract
The cosmetic composition of this invention which is a 2-methacryloyloxyethylphosphorylcholine polymer (Poly MPC) in a preferable amount of 0.001% to 10% by weight based on the total weight of the cosmetic composition. The cosmetic composition can repair damage to the skin and hair, such as dryness, loss of luster, etc. and enhance the moisture preservation capability thereof. It also has a good feel when applied.